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新疆大学物理科学与技术学院
Published:2020
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[1]王静,叶开秀.氧化层对掺杂单晶硅纳米薄膜杨氏模量的影响[J].新疆大学学报(自然科学版)(中英文),2020,37(01):17-22.
[1]王静,叶开秀.氧化层对掺杂单晶硅纳米薄膜杨氏模量的影响[J].新疆大学学报(自然科学版)(中英文),2020,37(01):17-22. DOI: 10.13568/j.cnki.651094.651316.2019.05.28.0002.
DOI:10.13568/j.cnki.651094.651316.2019.05.28.0002.
本文基于半连续体模型
利用Keating形变势从理论上研究了掺杂磷原子的硅纳米薄膜存在氧化层时
薄膜厚度对杨氏模量的影响;并且研究了氧化层的厚度对薄膜杨氏模量的影响.研究结果显示
薄膜的杨氏模量与它的厚度有关系
氧化层的存在增加了硅膜的杨氏模量
随着厚度的减小杨氏模量不断增加
最后趋于稳定;并且氧化层的厚度越大
硅纳米薄膜的杨氏模量越大.
Based on the semi-continuum model
the effect of ?lm thickness on Young's modulus of phosphorusdoped silicon nano?lms was studied theoretically by using Keating deformation potential
and the effect of oxide thickness on Young's modulus of ?lms was also studied. The results show that Young's modulus of the ?lm is related to its thickness. The addition of oxide layer increaseYoung's modulus of the silicon ?lm.As the thickness of the ?lm decreases
Young's modulus increase
and ?nally tends to be stable.And the large the oxide thickness is
the large the Young's modulus of the silicon nano?lm is.
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